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Etch resists for photovoltaic applications

Due to decades of experience with the development of etch and platings resists for highest requirements Lackwerke Peters gmbH + Co KG has proved to be a good partner for the photovoltaik industry.

SD 2052 AL

-distinguished by a good resistance to acid and alkaline etching baths up to ph 9, also to hydrofluoric acid
-can be used for imaging and etching processes for silicon substrates or glass